| Fast Growth of Strain-Free AIN on Graphene-Buffered Sapphire | |
Qi Y; Wang YY; Pang ZQ(庞振乾); Dou ZP; Wei TB; Gao P ; Zhang SS; Xu XZ; Chang ZH; Deng B; Chen SL; Chen ZL; Ci HN; Wang RY; Zhao FZ; Yan JC; Yi XY; Liu KH; Peng HL; Liu ZQ; Tong LM; Zhang J; Wei YJ(魏宇杰); Li JM; Liu ZF
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| Source Publication | JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
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| 2018-09-26 | |
| Volume | 140Issue:38Pages:11935-11941 |
| ISSN | 0002-7863 |
| Abstract | We study the roles of graphene acting as a buffer layer for growth of an A1N film on a sapphire substrate. Graphene can reduce the density of A1N nuclei but increase the growth rate for an individual nucleus at the initial growth stage. This can lead to the reduction of threading dislocations evolved at the coalescence boundaries. The graphene interlayer also weakens the interaction between AIN and sapphire and accommodates their large mismatch in the lattice and thermal expansion coefficients; thus, the compressive strain in A1N and the tensile strain in sapphire are largely relaxed. The effective relaxation of strain further leads to a low density of defects in the AIN films. These findings reveal the roles of graphene in III-nitride growth and offer valuable insights into the efficient applications of graphene in the light-emitting diode industry. |
| DOI | 10.1021/jacs.8b03871 |
| URL | 查看原文 |
| Indexed By | SCI ; EI |
| Language | 英语 |
| WOS ID | WOS:000446142500013 |
| WOS Keyword | VAPOR-PHASE EPITAXY ; LIGHT-EMITTING-DIODES ; SINGLE-CRYSTAL GRAPHENE ; GALLIUM-NITRIDE ; DISLOCATION DENSITY ; RAMAN-SPECTROSCOPY ; ALGAN/GAN HEMTS ; GAN EPILAYERS ; LASER-DIODES ; ALN |
| WOS Research Area | Chemistry, Multidisciplinary |
| WOS Subject | Chemistry |
| Funding Organization | National Key R&D Program of China [2018YFB0406703] ; National Natural Science Foundation of China [51432002, 61474109, 51290272, 51502007, 11474247, 51672007, Y761020000] ; National Equipment Program of China [ZDYZ2015-1] ; Beijing Municipal Science and Technology Planning Project [Z161100002116020, Z161100002116032] ; Beijing Natural Science Foundation [4182063] ; National Program for Thousand Young Talents of China ; "2011 Program" Peking-Tsinghua-IOP Collaborative Innovation Center of Quantum Matter |
| Classification | 一类 |
| Ranking | 1 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://dspace.imech.ac.cn/handle/311007/77857 |
| Collection | 非线性力学国家重点实验室 |
| Affiliation | 1.Peking Univ, Ctr Nanochem CNC, Coll Chem & Mol Engn, Beijing 100871, Peoples R China 2.Peking Univ, Beijing Natl Lab Mol Sci, Beijing 100871, Peoples R China 3.Peking Univ, Acad Adv Interdisciplinary Studies, Beijing 100871, Peoples R China 4.Peking Univ, Electron Microscopy Lab, Sch Phys, Beijing 100871, Peoples R China 5.Peking Univ, Int Ctr Quantum Mat, Beijing 100871, Peoples R China 6.Peking Univ, Sch Phys, State Key Lab Mesoscop Phys, Beijing 100871, Peoples R China 7.Chinese Acad Sci, Res & Dev Ctr Solid State Lighting, Inst Semicond, Beijing 100083, Peoples R China 8.Univ Chinese Acad Sci, Beijing 100049, Peoples R China 9.Chinese Acad Sci, Inst Mech, LNM, Beijing 100190, Peoples R China 10.Univ Chinese Acad Sci, Sch Engn Sci, Beijing 100049, Peoples R China 11.Collaborat Innovat Ctr Quantum Matter, Beijing 100871, Peoples R China 12.China Univ Petr, Coll Sci, Qingdao 266580, Peoples R China 13.Beijing Graphene Inst, Beijing 100095, Peoples R China |
| Recommended Citation GB/T 7714 | Qi Y,Wang YY,Pang ZQ,et al. Fast Growth of Strain-Free AIN on Graphene-Buffered Sapphire[J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY,2018,140,38,:11935-11941. |
| APA | Qi Y.,Wang YY.,庞振乾.,Dou ZP.,Wei TB.,...&Liu ZF.(2018).Fast Growth of Strain-Free AIN on Graphene-Buffered Sapphire.JOURNAL OF THE AMERICAN CHEMICAL SOCIETY,140(38),11935-11941. |
| MLA | Qi Y,et al."Fast Growth of Strain-Free AIN on Graphene-Buffered Sapphire".JOURNAL OF THE AMERICAN CHEMICAL SOCIETY 140.38(2018):11935-11941. |
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| IrJ2018243.pdf（1289KB） | 期刊论文 | 出版稿 | 开放获取 | CC BY-NC-SA | View Download | |
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